12-14 December 2022
IIT Jodhpur
Asia/Kolkata timezone

NF3 Based Plasma Etching System For Etching Of Silicon Substrate

Not scheduled
20m
IIT Jodhpur

IIT Jodhpur

Indian Institute of Technology, Jodhpur NH 62, Nagaur Road, Karwar, Jodhpur
Poster

Speaker

Dr Rajesh Kumar (IPR)

Primary authors

C. Jariwala (Institute for Plasma Research Gandhinagar ) H. L. Swami (Institute for Plasma Research Gandhinagar ) Dr Rajesh Kumar (IPR) Mr Vrushank Mehta (IPR ) Dr Yogendra kumar

Presentation materials

There are no materials yet.